Abstract
The atomic force microscope (AFM) is capable of resolving the plasma membrane with nanometer resolution. In this study we used the AFM to characterize hyperoxia-induced oxidative damage to changes in the plasma membranes of cultured human glioma cells (U87). U87 cells were exposed to 0.20 ATA O 2 , normobaric hyperoxia (0.95 ATA O 2 ) or hyperbaric hyperoxia (HBO 2 , 3.25 ATA O 2 ) for 30 min. In separate experiments H 2 O 2 (200 µM and 2 mM) was used as a positive control. Malondialdehyde (MDA) was measured to confirm lipid peroxidation. Following treatment, the cells were fixed with 2% glutaraldehyde and scanned in air or fluid. Individual cells from each group (n = 35 to 45 cells/group) were scanned and analyzed to assess average membrane roughness (R a ). The R a of the plasma membrane was 34 ± 3 nm, 57 ± 3 nm and 63 ± 5 nm in 0.20 ATA O 2 , 0.95 ATA O 2 and HBO 2 , respectively. In H 2 O 2 treated cells R a was 28 ± 4 nm, 56 ± 7 nm and 138 ± 14 nm in air (air in 5% CO 2 ), 200 µM and 2 mM H 2 O 2 . Co-treatment with antioxidant Trolox C (150 µM) significantly reduced R a during exposure to hyperoxia and H 2 O 2 , suggesting that the amount of membrane blebbing was proportional to the level of oxidative stress. Furthermore, measurement of MDA confirmed that H 2 O 2 and hyperoxia increased lipid peroxidation, suggesting that membrane blebbing is related to oxidative stress. In conclusion, these data demonstrate oxidative damage from lipid peroxidation increases with oxygen concentration.
Original language | American English |
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State | Published - Mar 1 2008 |
Disciplines
- Medical Cell Biology
- Medical Neurobiology
- Medical Physiology
- Medical Sciences
- Medicine and Health Sciences
- Neurosciences
- Physiological Processes