Automated and calibrated whole wafer etch pit density measurements in GaAs

J. S. Sewell; S. C. Dudley; M. G. Mier; D. C. Look; D. C. Walters

doi:10.1007/BF02657407

Automated and calibrated whole wafer etch pit density measurements in GaAs

J. S. Sewell, S. C. Dudley, M. G. Mier, D. C. Look, D. C. Walters

Future of Semiconductors, a National Science Foundation Program

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	191-197
Number of pages	7
Journal	Journal of Electronic Materials
Volume	18
Issue number	2
DOIs	https://doi.org/10.1007/BF02657407
State	Published - Mar 1989

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

Keywords

etch pit density
GaAs
infrared transmission

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10.1007/BF02657407

Cite this

@article{0b744a58e8404c018c48b7fa0310f226,

title = "Automated and calibrated whole wafer etch pit density measurements in GaAs",

keywords = "etch pit density, GaAs, infrared transmission",

author = "Sewell, {J. S.} and Dudley, {S. C.} and Mier, {M. G.} and Look, {D. C.} and Walters, {D. C.}",

year = "1989",

month = mar,

doi = "10.1007/BF02657407",

language = "English",

volume = "18",

pages = "191--197",

journal = "Journal of Electronic Materials",

issn = "0361-5235",

number = "2",

}

TY - JOUR

T1 - Automated and calibrated whole wafer etch pit density measurements in GaAs

AU - Sewell, J. S.

AU - Dudley, S. C.

AU - Mier, M. G.

AU - Look, D. C.

AU - Walters, D. C.

PY - 1989/3

Y1 - 1989/3

KW - etch pit density

KW - GaAs

KW - infrared transmission

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U2 - 10.1007/BF02657407

DO - 10.1007/BF02657407

M3 - Article

AN - SCOPUS:0024628472

SN - 0361-5235

VL - 18

SP - 191

EP - 197

JO - Journal of Electronic Materials

JF - Journal of Electronic Materials

IS - 2

ER -

Automated and calibrated whole wafer etch pit density measurements in GaAs

ASJC Scopus Subject Areas

Keywords

Access to Document

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