Abstract
The authors demonstrate a method for the fabrication of in situ ultrathin porous anodic aluminum oxide layers (aspect ration < 2:1 ) on Si, which can be directly used as templates for nanodot preparation and for pattern transfer. The regular shape of the aluminum oxide pores is maintained even when the thickness of the aluminum oxide template is reduced to 50nm. By using these in situ ultrathin templates as lift-off masks, the authors successfully prepared a BaxSr1-xTiO3 nanodot array on Si surface. Furthermore, these nanotemplates are employed as lithographic masks to transfer the nanopattern into the silicon substrate.
Original language | American English |
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Journal | Applied Physics Letters |
Volume | 91 |
Issue number | 5 |
DOIs | |
State | Published - Jul 2007 |
Externally published | Yes |
Keywords
- Etching
- Materials treatment
- Nanodots
- Nanomaterials
- Oxides
- Metal oxides
- Chemical elements
- Electrolysis
- Solgels
- Semiconductors
Disciplines
- Electrical and Computer Engineering