High-resistivity nanogranular Co-Al-O films for high-frequency applications

Pedram Khalili Amiri; Yan Zhuang; Hugo Schellevis; Behzad Rejaei; Marina Vroubel; Yue Ma; Joachim N. Burghartz

doi:10.1063/1.2710235

High-resistivity nanogranular Co-Al-O films for high-frequency applications

Pedram Khalili Amiri, Yan Zhuang, Hugo Schellevis, Behzad Rejaei, Marina Vroubel, Yue Ma, Joachim N. Burghartz

Research output: Contribution to journal › Article › peer-review

Abstract

This work presents a series of high-resistivity nanogranular Co-Al-O films with maximum resistivity of ∼110 m cm. The films were deposited using pulsed dc reactive sputtering of a Co72 Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s -parameter measurements on microstrip transmission lines with Co-Al-O magnetic cores. The high-frequency magnetic permeability profile was extracted from the microstrip measurements. Reduction of deposition power resulted in resistivity enhancement, as well as reduction of coercivity and permeability. SEM images reveal an average grain size of ∼80 nm for films with the highest resistivity.

Original language	English
Article number	09M508
Journal	Journal of Applied Physics
Volume	101
Issue number	9
DOIs	https://doi.org/10.1063/1.2710235
State	Published - 2007
Externally published	Yes
Event	10th Joint MMM/Intermag Conference - Baltimore, United States Duration: Jan 7 2007 → Jan 11 2007 Conference number: 10

ASJC Scopus Subject Areas

General Physics and Astronomy

Keywords

Magnetic equipment
Eddy current
Electromagnetism
Magnetic fields
Telecommunications engineering
Magnetic materials
Resistivity measurements
Scanning electron microscopy
Sputter deposition
Thin films

Disciplines

Electrical and Computer Engineering

Access to Document

10.1063/1.2710235

Cite this

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title = "High-resistivity nanogranular Co-Al-O films for high-frequency applications",

abstract = "This work presents a series of high-resistivity nanogranular Co-Al-O films with maximum resistivity of ∼110 m cm. The films were deposited using pulsed dc reactive sputtering of a Co72 Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s -parameter measurements on microstrip transmission lines with Co-Al-O magnetic cores. The high-frequency magnetic permeability profile was extracted from the microstrip measurements. Reduction of deposition power resulted in resistivity enhancement, as well as reduction of coercivity and permeability. SEM images reveal an average grain size of ∼80 nm for films with the highest resistivity.",

keywords = "Magnetic equipment, Eddy current, Electromagnetism, Magnetic fields, Telecommunications engineering, Magnetic materials, Resistivity measurements, Scanning electron microscopy, Sputter deposition, Thin films",

author = "{Khalili Amiri}, Pedram and Yan Zhuang and Hugo Schellevis and Behzad Rejaei and Marina Vroubel and Yue Ma and Burghartz, {Joachim N.}",

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doi = "10.1063/1.2710235",

language = "English",

volume = "101",

journal = "Journal of Applied Physics",

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note = "10th Joint MMM/Intermag Conference ; Conference date: 07-01-2007 Through 11-01-2007",

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T1 - High-resistivity nanogranular Co-Al-O films for high-frequency applications

AU - Khalili Amiri, Pedram

AU - Zhuang, Yan

AU - Schellevis, Hugo

AU - Rejaei, Behzad

AU - Vroubel, Marina

AU - Ma, Yue

AU - Burghartz, Joachim N.

N1 - Conference code: 10

PY - 2007

Y1 - 2007

N2 - This work presents a series of high-resistivity nanogranular Co-Al-O films with maximum resistivity of ∼110 m cm. The films were deposited using pulsed dc reactive sputtering of a Co72 Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s -parameter measurements on microstrip transmission lines with Co-Al-O magnetic cores. The high-frequency magnetic permeability profile was extracted from the microstrip measurements. Reduction of deposition power resulted in resistivity enhancement, as well as reduction of coercivity and permeability. SEM images reveal an average grain size of ∼80 nm for films with the highest resistivity.

AB - This work presents a series of high-resistivity nanogranular Co-Al-O films with maximum resistivity of ∼110 m cm. The films were deposited using pulsed dc reactive sputtering of a Co72 Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s -parameter measurements on microstrip transmission lines with Co-Al-O magnetic cores. The high-frequency magnetic permeability profile was extracted from the microstrip measurements. Reduction of deposition power resulted in resistivity enhancement, as well as reduction of coercivity and permeability. SEM images reveal an average grain size of ∼80 nm for films with the highest resistivity.

KW - Magnetic equipment

KW - Eddy current

KW - Electromagnetism

KW - Magnetic fields

KW - Telecommunications engineering

KW - Magnetic materials

KW - Resistivity measurements

KW - Scanning electron microscopy

KW - Sputter deposition

KW - Thin films

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DO - 10.1063/1.2710235

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JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 9

M1 - 09M508

T2 - 10th Joint MMM/Intermag Conference

Y2 - 7 January 2007 through 11 January 2007

ER -

High-resistivity nanogranular Co-Al-O films for high-frequency applications

Abstract

ASJC Scopus Subject Areas

Keywords

Disciplines

Access to Document

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Activities

10th Joint MMM/Intermag Conference

Cite this