Hydrogen incorporation and diffusivity in plasma-exposed bulk ZnO

K. Ip; M. E. Overberg; Y. W. Heo; D. P. Norton; S. J. Pearton; C. E. Stutz; B. Luo; F. Ren; D. C. Look; J. M. Zavada

doi:10.1063/1.1539927

Hydrogen incorporation and diffusivity in plasma-exposed bulk ZnO

K. Ip, M. E. Overberg, Y. W. Heo, D. P. Norton, S. J. Pearton, C. E. Stutz, B. Luo, F. Ren, D. C. Look, J. M. Zavada

Future of Semiconductors, a National Science Foundation Program

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	385-387
Number of pages	3
Journal	Applied Physics Letters
Volume	82
Issue number	3
DOIs	https://doi.org/10.1063/1.1539927
State	Published - Jan 20 2003

ASJC Scopus Subject Areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1539927

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title = "Hydrogen incorporation and diffusivity in plasma-exposed bulk ZnO",

author = "K. Ip and Overberg, {M. E.} and Heo, {Y. W.} and Norton, {D. P.} and Pearton, {S. J.} and Stutz, {C. E.} and B. Luo and F. Ren and Look, {D. C.} and Zavada, {J. M.}",

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T1 - Hydrogen incorporation and diffusivity in plasma-exposed bulk ZnO

AU - Ip, K.

AU - Overberg, M. E.

AU - Heo, Y. W.

AU - Norton, D. P.

AU - Pearton, S. J.

AU - Stutz, C. E.

AU - Luo, B.

AU - Ren, F.

AU - Look, D. C.

AU - Zavada, J. M.

PY - 2003/1/20

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U2 - 10.1063/1.1539927

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SP - 385

EP - 387

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 3

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Hydrogen incorporation and diffusivity in plasma-exposed bulk ZnO

ASJC Scopus Subject Areas

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