Image processing plume fluence for superconducting thin-film depositions

J. G. Jones; R. R. Biggers; J. D. Busbee; D. V. Dempsey; G. Kozlowski

doi:10.1109/IPMM.1999.791562

Image processing plume fluence for superconducting thin-film depositions

J. G. Jones, R. R. Biggers, J. D. Busbee, D. V. Dempsey, G. Kozlowski

Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Process control is a crucial element in all deposition techniques. It is especially elusive in the versatile and efficient deposition technique known as pulsed-laser-deposition (PLD). Image processed emissions from the plume of a YBa2Cu3O/sub 7-x/ (YBCO) target are monitored in situ to determine two dimensional spatial information about the plume. Manual and fuzzy-logic based regulation of laser energy based on this plume emission feedback resulted in improved film quality and repeatability of the PLD thin-film depositions. Imaging of the plume under various deposition conditions, both with and without process control, will help to improve understanding of the effect of changing environmental conditions on the plume characteristics.

Original language	English
Title of host publication	Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999
Editors	Marcello M. Veiga, John A. Meech, Michael H. Smith, Steven R. LeClair
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	1317-1320
Number of pages	4
Volume	2
ISBN (Electronic)	9780780354890
ISBN (Print)	0-7803-5489-3
DOIs	https://doi.org/10.1109/IPMM.1999.791562
State	Published - 1999
Event	2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999 - Honolulu, United States Duration: Jul 10 1999 → Jul 15 1999

Conference

Conference	2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999
Country/Territory	United States
City	Honolulu
Period	7/10/99 → 7/15/99

ASJC Scopus Subject Areas

Industrial and Manufacturing Engineering
Materials Science (miscellaneous)

Keywords

Control non-linearities
Fuzzy logic
Image processing
Process control
Process identification
Superconducting thin films
Sputtering
Logic

Disciplines

Materials Science and Engineering
Engineering Physics
Artificial Intelligence and Robotics

Access to Document

10.1109/IPMM.1999.791562

Cite this

Jones, J. G., Biggers, R. R., Busbee, J. D., Dempsey, D. V., & Kozlowski, G. (1999). Image processing plume fluence for superconducting thin-film depositions. In M. M. Veiga, J. A. Meech, M. H. Smith, & S. R. LeClair (Eds.), Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999 (Vol. 2, pp. 1317-1320). Article 791562 Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IPMM.1999.791562

Image processing plume fluence for superconducting thin-film depositions. / Jones, J. G.; Biggers, R. R.; Busbee, J. D. et al.
Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999. ed. / Marcello M. Veiga; John A. Meech; Michael H. Smith; Steven R. LeClair. Vol. 2 Institute of Electrical and Electronics Engineers Inc., 1999. p. 1317-1320 791562.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Jones, JG, Biggers, RR, Busbee, JD, Dempsey, DV & Kozlowski, G 1999, Image processing plume fluence for superconducting thin-film depositions. in MM Veiga, JA Meech, MH Smith & SR LeClair (eds), Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999. vol. 2, 791562, Institute of Electrical and Electronics Engineers Inc., pp. 1317-1320, 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999, Honolulu, United States, 7/10/99. https://doi.org/10.1109/IPMM.1999.791562

Jones JG, Biggers RR, Busbee JD, Dempsey DV, Kozlowski G. Image processing plume fluence for superconducting thin-film depositions. In Veiga MM, Meech JA, Smith MH, LeClair SR, editors, Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999. Vol. 2. Institute of Electrical and Electronics Engineers Inc. 1999. p. 1317-1320. 791562 doi: 10.1109/IPMM.1999.791562

Jones, J. G. ; Biggers, R. R. ; Busbee, J. D. et al. / Image processing plume fluence for superconducting thin-film depositions. Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999. editor / Marcello M. Veiga ; John A. Meech ; Michael H. Smith ; Steven R. LeClair. Vol. 2 Institute of Electrical and Electronics Engineers Inc., 1999. pp. 1317-1320

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abstract = "Process control is a crucial element in all deposition techniques. It is especially elusive in the versatile and efficient deposition technique known as pulsed-laser-deposition (PLD). Image processed emissions from the plume of a YBa2Cu3O/sub 7-x/ (YBCO) target are monitored in situ to determine two dimensional spatial information about the plume. Manual and fuzzy-logic based regulation of laser energy based on this plume emission feedback resulted in improved film quality and repeatability of the PLD thin-film depositions. Imaging of the plume under various deposition conditions, both with and without process control, will help to improve understanding of the effect of changing environmental conditions on the plume characteristics.",

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AU - Kozlowski, G.

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AB - Process control is a crucial element in all deposition techniques. It is especially elusive in the versatile and efficient deposition technique known as pulsed-laser-deposition (PLD). Image processed emissions from the plume of a YBa2Cu3O/sub 7-x/ (YBCO) target are monitored in situ to determine two dimensional spatial information about the plume. Manual and fuzzy-logic based regulation of laser energy based on this plume emission feedback resulted in improved film quality and repeatability of the PLD thin-film depositions. Imaging of the plume under various deposition conditions, both with and without process control, will help to improve understanding of the effect of changing environmental conditions on the plume characteristics.

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ER -

Image processing plume fluence for superconducting thin-film depositions

Abstract

Conference

ASJC Scopus Subject Areas

Keywords

Disciplines

Access to Document

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