Metal contacts on bulk ZnO crystal treated with remote oxygen plasma

Z. Q. Fang; B. Claflin; D. C. Look; Y. F. Dong; L. Brillson

doi:10.1116/1.3095814

Metal contacts on bulk ZnO crystal treated with remote oxygen plasma

Z. Q. Fang, B. Claflin, D. C. Look, Y. F. Dong, L. Brillson

Future of Semiconductors, a National Science Foundation Program

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1774-1779
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Volume	27
Issue number	3
DOIs	https://doi.org/10.1116/1.3095814
State	Published - 2009

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Instrumentation
Process Chemistry and Technology
Surfaces, Coatings and Films
Electrical and Electronic Engineering
Materials Chemistry

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10.1116/1.3095814

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title = "Metal contacts on bulk ZnO crystal treated with remote oxygen plasma",

author = "Fang, \{Z. Q.\} and B. Claflin and Look, \{D. C.\} and Dong, \{Y. F.\} and L. Brillson",

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pages = "1774--1779",

journal = "Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics",

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AU - Claflin, B.

AU - Look, D. C.

AU - Dong, Y. F.

AU - Brillson, L.

PY - 2009

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VL - 27

SP - 1774

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JO - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

JF - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

IS - 3

ER -

Metal contacts on bulk ZnO crystal treated with remote oxygen plasma

ASJC Scopus Subject Areas

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