Modeling of substrate impacts on formation of bilayer silicene

Kumar Vishal; Yan Zhuang; Hong Huang

doi:10.1016/j.mssp.2026.110694

Modeling of substrate impacts on formation of bilayer silicene

Kumar Vishal
, Yan Zhuang
, Hong Huang

Research output: Contribution to journal › Article › peer-review

Original language	English
Article number	110694
Journal	Materials Science in Semiconductor Processing
Volume	210
DOIs	https://doi.org/10.1016/j.mssp.2026.110694
State	Published - Aug 1 2026
Externally published	Yes

ASJC Scopus Subject Areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Keywords

Airgap
Band opening
DFT
Silicene
Strain
Two-dimension

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10.1016/j.mssp.2026.110694

Cite this

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title = "Modeling of substrate impacts on formation of bilayer silicene",

keywords = "Airgap, Band opening, DFT, Silicene, Strain, Two-dimension",

author = "Kumar Vishal and Yan Zhuang and Hong Huang",

note = "Publisher Copyright: {\textcopyright} 2026",

year = "2026",

month = aug,

day = "1",

doi = "10.1016/j.mssp.2026.110694",

language = "English",

volume = "210",

journal = "Materials Science in Semiconductor Processing",

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TY - JOUR

T1 - Modeling of substrate impacts on formation of bilayer silicene

AU - Vishal, Kumar

AU - Zhuang, Yan

AU - Huang, Hong

PY - 2026/8/1

Y1 - 2026/8/1

KW - Airgap

KW - Band opening

KW - DFT

KW - Silicene

KW - Strain

KW - Two-dimension

UR - https://www.scopus.com/pages/publications/105036454635

UR - https://www.scopus.com/pages/publications/105036454635#tab=citedBy

U2 - 10.1016/j.mssp.2026.110694

DO - 10.1016/j.mssp.2026.110694

M3 - Article

AN - SCOPUS:105036454635

SN - 1369-8001

VL - 210

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

M1 - 110694

ER -

Modeling of substrate impacts on formation of bilayer silicene

ASJC Scopus Subject Areas

Keywords

Access to Document

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Cite this