Novel ga/ascl3/h2 reactor for controlling stoichiometry in the growth of vapor phase epitaxy (vpe) gaas

  • P. C. Colter
  • , C. W. Litton
  • , D. C. Reynolds
  • , D. C. Look
  • , P. W. Yu
  • , S. S. Li
  • , W. L. Wang

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)28-35
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume323
DOIs
StatePublished - Sep 15 1982

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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