Patterned FeNi thin film for RF and microwave components

Marina Vroubel; Yan Zhuang; Bezhad Rejaei; Joachim Burghartz

doi:10.1016/S0304-8853(02)01032-6

Patterned FeNi thin film for RF and microwave components

Marina Vroubel, Yan Zhuang, Bezhad Rejaei, Joachim Burghartz

Research output: Contribution to journal › Conference article › peer-review

Abstract

NiFe is a well-known and commonly used material. However, its application for RF is mainly restricted by the low ferromagnetic resonance frequency (∼0.1 GHz). For practical applications it would be useful to try to shift this frequency to higher regions by exploiting the extra anisotropy induced by patterning the film. In this work, we discuss the model describing the permeability behavior as a function of frequency in thin patterned samples and apply this model to explain experimental results for patterned Ni78Fe22.

Original language	English
Pages (from-to)	167-169
Number of pages	3
Journal	Journal of Magnetism and Magnetic Materials
Volume	258-259
DOIs	https://doi.org/10.1016/S0304-8853(02)01032-6
State	Published - Mar 2003
Externally published	Yes
Event	Second Moscow International Symposium on Magnetism (MISM) - Moscow, Russian Federation Duration: Jun 20 2001 → Jun 24 2001

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

Keywords

Ferromagnetic resonance
Microwave application
Permeability
Thin films - ferromagnetic

Disciplines

Electrical and Computer Engineering

Access to Document

10.1016/S0304-8853(02)01032-6

Cite this

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title = "Patterned FeNi thin film for RF and microwave components",

abstract = "NiFe is a well-known and commonly used material. However, its application for RF is mainly restricted by the low ferromagnetic resonance frequency (∼0.1 GHz). For practical applications it would be useful to try to shift this frequency to higher regions by exploiting the extra anisotropy induced by patterning the film. In this work, we discuss the model describing the permeability behavior as a function of frequency in thin patterned samples and apply this model to explain experimental results for patterned Ni78Fe22.",

keywords = "Ferromagnetic resonance, Microwave application, Permeability, Thin films - ferromagnetic",

author = "Marina Vroubel and Yan Zhuang and Bezhad Rejaei and Joachim Burghartz",

year = "2003",

month = mar,

doi = "10.1016/S0304-8853(02)01032-6",

language = "English",

volume = "258-259",

pages = "167--169",

journal = "Journal of Magnetism and Magnetic Materials",

issn = "0304-8853",

note = "Second Moscow International Symposium on Magnetism (MISM) ; Conference date: 20-06-2001 Through 24-06-2001",

}

TY - JOUR

T1 - Patterned FeNi thin film for RF and microwave components

AU - Vroubel, Marina

AU - Zhuang, Yan

AU - Rejaei, Bezhad

AU - Burghartz, Joachim

PY - 2003/3

Y1 - 2003/3

N2 - NiFe is a well-known and commonly used material. However, its application for RF is mainly restricted by the low ferromagnetic resonance frequency (∼0.1 GHz). For practical applications it would be useful to try to shift this frequency to higher regions by exploiting the extra anisotropy induced by patterning the film. In this work, we discuss the model describing the permeability behavior as a function of frequency in thin patterned samples and apply this model to explain experimental results for patterned Ni78Fe22.

AB - NiFe is a well-known and commonly used material. However, its application for RF is mainly restricted by the low ferromagnetic resonance frequency (∼0.1 GHz). For practical applications it would be useful to try to shift this frequency to higher regions by exploiting the extra anisotropy induced by patterning the film. In this work, we discuss the model describing the permeability behavior as a function of frequency in thin patterned samples and apply this model to explain experimental results for patterned Ni78Fe22.

KW - Ferromagnetic resonance

KW - Microwave application

KW - Permeability

KW - Thin films - ferromagnetic

UR - http://www.scopus.com/inward/record.url?scp=0037338405&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037338405&partnerID=8YFLogxK

U2 - 10.1016/S0304-8853(02)01032-6

DO - 10.1016/S0304-8853(02)01032-6

M3 - Conference article

AN - SCOPUS:0037338405

SN - 0304-8853

VL - 258-259

SP - 167

EP - 169

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

T2 - Second Moscow International Symposium on Magnetism (MISM)

Y2 - 20 June 2001 through 24 June 2001

ER -

Patterned FeNi thin film for RF and microwave components

Abstract

ASJC Scopus Subject Areas

Keywords

Disciplines

Access to Document

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Activities

Second Moscow International Symposium on Magnetism (MISM)

Cite this