Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates

B. Claflin, G. J. Grzybowski, S. Zollner, B. R. Rogers, T. A. Cooper, D. C. Look

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Article number052204
JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Volume42
Issue number5
DOIs
StatePublished - Sep 1 2024

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

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