Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates

  • B. Claflin
  • , G. J. Grzybowski
  • , S. Zollner
  • , B. R. Rogers
  • , T. A. Cooper
  • , D. C. Look

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Article number052204
JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Volume42
Issue number5
DOIs
StatePublished - Sep 1 2024

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

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