Surface scattering of x-ray from InP (001) wafers

J. H. Li, S. F. Cui, M. Li, C. R. Li, Z. H. Mai, Y. T. Wang, Yan Zhuang

Research output: Contribution to journalLetterpeer-review

Abstract

We have studied the surface scattering of x rays from mechanical‐chemical polished InP (001) wafers with sulfur and/or iron doping. The scattering intensities in the scans transverse to the specular reflection rod were found to contain two components. A simple surface model was proposed to explain the experimental data. The results were also compared with those obtained from crystal truncation rod measurements.
Original languageAmerican English
Pages (from-to)3317–3319
JournalApplied Physics Letters
Volume65
Issue number26
DOIs
StatePublished - Dec 26 1994
Externally publishedYes

Keywords

  • X-ray diffraction

Disciplines

  • Electrical and Computer Engineering

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