Surface scattering of x-ray from InP (001) wafers

J. H. Li; S. F. Cui; M. Li; C. R. Li; Z. H. Mai; Y. T. Wang; Yan Zhuang

doi:10.1063/1.112446

Surface scattering of x-ray from InP (001) wafers

J. H. Li, S. F. Cui, M. Li, C. R. Li, Z. H. Mai, Y. T. Wang, Yan Zhuang

Research output: Contribution to journal › Letter › peer-review

Abstract

We have studied the surface scattering of x rays from mechanical‐chemical polished InP (001) wafers with sulfur and/or iron doping. The scattering intensities in the scans transverse to the specular reflection rod were found to contain two components. A simple surface model was proposed to explain the experimental data. The results were also compared with those obtained from crystal truncation rod measurements.

Original language	American English
Pages (from-to)	3317–3319
Journal	Applied Physics Letters
Volume	65
Issue number	26
DOIs	https://doi.org/10.1063/1.112446
State	Published - Dec 26 1994
Externally published	Yes

Keywords

X-ray diffraction

Disciplines

Electrical and Computer Engineering

Access to Document

10.1063/1.112446

Cite this

@article{f2e2427475d14d6fbf1eb1f9006c679c,

title = "Surface scattering of x-ray from InP (001) wafers",

abstract = "We have studied the surface scattering of x rays from mechanical‐chemical polished InP (001) wafers with sulfur and/or iron doping. The scattering intensities in the scans transverse to the specular reflection rod were found to contain two components. A simple surface model was proposed to explain the experimental data. The results were also compared with those obtained from crystal truncation rod measurements.",

keywords = "X-ray diffraction",

author = "Li, \{J. H.\} and Cui, \{S. F.\} and M. Li and Li, \{C. R.\} and Mai, \{Z. H.\} and Wang, \{Y. T.\} and Yan Zhuang",

year = "1994",

month = dec,

day = "26",

doi = "10.1063/1.112446",

language = "American English",

volume = "65",

pages = "3317–3319",

journal = "Applied Physics Letters",

issn = "0003-6951",

number = "26",

}

TY - JOUR

T1 - Surface scattering of x-ray from InP (001) wafers

AU - Li, J. H.

AU - Cui, S. F.

AU - Li, M.

AU - Li, C. R.

AU - Mai, Z. H.

AU - Wang, Y. T.

AU - Zhuang, Yan

PY - 1994/12/26

Y1 - 1994/12/26

N2 - We have studied the surface scattering of x rays from mechanical‐chemical polished InP (001) wafers with sulfur and/or iron doping. The scattering intensities in the scans transverse to the specular reflection rod were found to contain two components. A simple surface model was proposed to explain the experimental data. The results were also compared with those obtained from crystal truncation rod measurements.

AB - We have studied the surface scattering of x rays from mechanical‐chemical polished InP (001) wafers with sulfur and/or iron doping. The scattering intensities in the scans transverse to the specular reflection rod were found to contain two components. A simple surface model was proposed to explain the experimental data. The results were also compared with those obtained from crystal truncation rod measurements.

KW - X-ray diffraction

U2 - 10.1063/1.112446

DO - 10.1063/1.112446

M3 - Letter

SN - 0003-6951

VL - 65

SP - 3317

EP - 3319

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 26

ER -