The effect of Si doping on the electrical properties of B12 As2 thin films on (0001) 6H-SiC substrates

Zhou Xu; J. H. Edgar; D. C. Look; S. Baumann; R. J. Bleiler; S. H. Wang; S. E. Mohney

doi:10.1063/1.2437687

The effect of Si doping on the electrical properties of B12 As2 thin films on (0001) 6H-SiC substrates

Zhou Xu, J. H. Edgar, D. C. Look, S. Baumann, R. J. Bleiler, S. H. Wang, S. E. Mohney

Future of Semiconductors, a National Science Foundation Program

Research output: Contribution to journal › Article › peer-review

Original language	English
Article number	053710
Journal	Journal of Applied Physics
Volume	101
Issue number	5
DOIs	https://doi.org/10.1063/1.2437687
State	Published - 2007

ASJC Scopus Subject Areas

General Physics and Astronomy

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10.1063/1.2437687

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title = "The effect of Si doping on the electrical properties of B12 As2 thin films on (0001) 6H-SiC substrates",

author = "Zhou Xu and Edgar, {J. H.} and Look, {D. C.} and S. Baumann and Bleiler, {R. J.} and Wang, {S. H.} and Mohney, {S. E.}",

year = "2007",

doi = "10.1063/1.2437687",

language = "English",

volume = "101",

journal = "Journal of Applied Physics",

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T1 - The effect of Si doping on the electrical properties of B12 As2 thin films on (0001) 6H-SiC substrates

AU - Xu, Zhou

AU - Edgar, J. H.

AU - Look, D. C.

AU - Baumann, S.

AU - Bleiler, R. J.

AU - Wang, S. H.

AU - Mohney, S. E.

PY - 2007

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M3 - Article

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SN - 0021-8979

VL - 101

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 5

M1 - 053710

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The effect of Si doping on the electrical properties of B12 As2 thin films on (0001) 6H-SiC substrates

ASJC Scopus Subject Areas

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