THz Characterization of ITO Films on P-Si Substrates

E. R. Brown, W. D. Zhang, H. Chen, G. T. Mearini

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper reports broadband THz free-space transmission measurements and modeling of indium-tin-oxide (ITO) thin films on p-doped Si substrates. Two such samples having ITO thickness of 50 and 100 nm, and DC sheet conductance 260 and 56Ω/sq, respectively, were characterized between 0.2 and 1.2 THz using a frequency-domain spectrometer. The 50-nm-film sample displayed very flat transmittance over the 1-THz bandwidth, suggesting it is close to the critical THz sheet conductance that suppresses multi-pass interference and thereby achieves THz passive equalization. This is consistent with a simple transmission-line (TEM wave) model of the propagation. Also, the value of THz sheet conductance that best fits the transmittance data is roughly 50% higher than the dc value for both samples, suggesting that the ac conductivity is non-Drudian.
Original languageEnglish
Title of host publicationPIERS 2015 Prague - Progress In Electromagnetics Research Symposium, Proceedings
PublisherElectromagnetics Academy
Pages1182-1186
Number of pages5
ISBN (Electronic)9781934142301
StatePublished - 2015

Publication series

NameProgress in Electromagnetics Research Symposium
Volume2015-January
ISSN (Print)1559-9450
ISSN (Electronic)1931-7360

ASJC Scopus Subject Areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Keywords

  • ITO Films
  • Tetrahertz spectroscopy

Disciplines

  • Physics

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